Lin, Burn Jeng: search on Z-Library

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1

Electromagnetic Near-Field Diffraction of a Medium Slit

Journal:

Journal of the Optical Society of America

Year:

1972

Language:

english

File:

PDF, 545 KB

english, 1972

2

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Immersion lithography and its impact on semiconductor manufacturing

Lin, Burn-Jeng, Smith, Bruce W.

Year:

2004

Language:

english

File:

PDF, 960 KB

english, 2004

3

A study of projected optical images for typical IC mask patterns illuminated by partially coherent light

Liu, A.C., Burn Jeng Lin

Journal:

IEEE Transactions on Electron Devices

Year:

1983

Language:

english

File:

PDF, 1.68 MB

english, 1983

4

Deep uv lithography

Journal:

Journal of Vacuum Science and Technology

Year:

1975

Language:

english

File:

PDF, 1.03 MB

english, 1975

5

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

Liu, Chun-Hung, Ng, Hoi-Tou, Ng, Philip C. W., Tsai, Kuen-Yu, Lin, Shy-Jay, Chen, Jeng-Homg, Chen, Alek C., Lin, Burn, Yen, Anthony

Year:

2008

Language:

english

File:

PDF, 386 KB

english, 2008

6

A double-exposure technique to macroscopically control submicrometer linewidths in positive resist images

Journal:

IEEE Transactions on Electron Devices

Year:

1978

Language:

english

File:

PDF, 785 KB

english, 1978

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Influence of data volume and EPC on process window in massively parallel e-beam direct write

Lin, Shy-Jay, Tong, William M., Resnick, Douglas J., Liu, Pei-Yi, Chen, Cheng-Hung, Wang, Wen-Chuan, Shin, Jaw-Jung, Lin, Burn Jeng, McCord, Mark A., Shriyan, Sameet K.

Year:

2013

Language:

english

File:

PDF, 1.25 MB

english, 2013

8

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Accelerating 32nm BEOL technology development by advanced wafer inspection methodology

Jeng, P. R., Chen, Alek C., Lin, Burn, Lin, C. L., Jang, Simon, Yen, Anthony, Liang, M. S., Chen, Wallas, Tsui, David, Chen, Damian, Chen, Henry, Young, Chris, Chang, Ellis

Year:

2008

Language:

english

File:

PDF, 580 KB

english, 2008

9

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Two threshold resist models for optical proximity correction

Huang, Wen-Chun, Smith, Bruce W., Lin, Chia-Hui, Kuo, Chin-Chen, Huang, C. C., Lin, J. F., Chen, Jeng-Horng, Liu, Ru-Gun, Ku, Yao C., Lin, Burn-Jeng

Year:

2004

Language:

english

File:

PDF, 1.60 MB

english, 2004

10

On-Wafer FinFET-Based EUV/eBeam Detector Arrays for Advanced Lithography Processes

Wang, Chien-Ping, Tsai, Yi-Pei, Lin, Burn Jeng, Liang, Zheng-Yong, Chiu, Po-Wen, Shih, Jiaw-Ren, Lin, Chrong Jung, King, Ya-Chin

Journal:

IEEE Transactions on Electron Devices

Year:

2020

File:

PDF, 2.45 MB

2020

11

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Mask-making study for the 65-nm node

Chen, Chia-Jen, Lee, Hsin-Chang, Lu, Chi-Lun, Hsieh, Ren-Guey, Chen, Wen-Chi, Hsieh, Hung-Chang, Lin, Burn-Jeng, Kimmel, Kurt R., Staud, Wolfgang

Year:

2003

Language:

english

File:

PDF, 341 KB

english, 2003

12

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Phenomena and OPC solution of ripple patterns for 65-nm node

Lai, Chih-Ming, Smith, Bruce W., Ho, Jeng-Shiun, Lai, Chien-Wen, Tsai, Cheng-Kun, Tsay, Cherng-Shyan, Chen, Jeng-Horng, Liu, Ru-Gun, Ku, Yao C., Lin, Burn-Jeng

Year:

2004

Language:

english

File:

PDF, 2.84 MB

english, 2004

13

Holographic imaging and aberrations due to an incorrectly repositioned hologram in a system with lenses having aberrations

Lin, Burn Jeng, Collins, Jr., Stuart A.

Journal:

Journal of the Optical Society of America

Year:

1973

Language:

english

File:

PDF, 1.07 MB

english, 1973

14

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - General scaling law of optical lithography optical theory

Chen, Chun-Kuang, Smith, Bruce W., Gau, Tsai-Sheng, Chen, Li-Jui, Lee, Chi-Chuang, Shin, Jaw-Jung, Yen, Anthony, Lin, Burn-Jeng

Year:

2004

Language:

english

File:

PDF, 850 KB

english, 2004

15

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Pattern-dependence optical phase effect on alternating phase shift mask

Chang, Bin-Chang, Tanabe, Hiroyoshi, You, Jan-Wen, Lu, Ming, Lee, Chiu-Lien, Kung, Li-Wei, Shu, King-Chang, Shin, Jaw-Jung, Gau, Tsai-Sheng, Lin, Burn-Jeng

Year:

2003

Language:

english

File:

PDF, 1.64 MB

english, 2003

16

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Study of line edge roughness using continuous wavelet transform for 65-nm node

Shiu, Lin-Hung, Smith, Bruce W., Chen, Chun-Kuang, Gau, Tsai-Sheng, Lin, Burn-Jeng

Year:

2004

Language:

english

File:

PDF, 656 KB

english, 2004

17

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Ke, Chih-Ming, Silver, Richard M., Hung, Hsueh-Liang, Chang, Anderson, Chen, Jeng-Horng, Gau, Tsai-Sheng, Ku, Yao-Ching, Lin, Burn J., Otaka, Tadashi, Ueda, Kazuhiro, Kawada, Hiroki, Nomura, Hiroaki,

Year:

2004

Language:

english

File:

PDF, 676 KB

english, 2004

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